Creation of integrated circuits elements by using low temperature technology

Author: Zurab Kushitashvili
Keywords: plazma, catalizator
Annotation:

For the development of Micro and Nano devices is necessary to increase integration quality and reliability . This scheme is implemented by decreasing the geometric size of elements and in their adoption technology establishing a new low temperature (300-400 0C) processes

Lecture files:

presentation011079 [ka]