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Creation of integrated circuits elements by using low temperature technology
Author: Zurab KushitashviliKeywords: plazma, catalizator
Annotation:
For the development of Micro and Nano devices is necessary to increase integration quality and reliability . This scheme is implemented by decreasing the geometric size of elements and in their adoption technology establishing a new low temperature (300-400 0C) processes
Lecture files:
presentation011079 [ka]